Optical Recorder of Nanostructures and Microstructures for Quantum Technologies

• Country: Czech Republic
• Summary: Optical Recorder of Nanostructures and Microstructures for Quantum Technologies
• CZT Ref No: 78562023
• Deadline: 10 Mar 2023
• Financier: Self Financed
• Purchaser Ownership: Government
• Tender Value: Refer Document
• Notice Type: Tender
• Document Ref. No.: F2023-006264
• Purchaser's Detail:
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• Description:
• (nature and amount of work, supplies or services or indication of relevant needs and requirements) The subject of the contract is the supply of a compact optical lithographic system with simple operation, which enables direct writing into the photoresist at high speed without the use of a mask. The system must enableand recording both on large surfaces with variable resolution and on multiple sub-millimeter wafers at the same time in high resolution, as well as multiple recording with precise alignment and the possibility of a virtual preview before exposure. 385 nm light source (with a possible deviation of +/-5 nm), which is suitable for both positive and negativeit, broadband, g-, h-, i-line and also usable for SU-8 photoresists. The system must enable long-term high-resolution exposures with effective suppression of vibrations and temperature fluctuations. The system must include a control unit, software for controlling the lithography and real-time imaging.
  Subject to pThe contract is the supply of a compact optical lithography system with simple operation, which enables direct writing into the photoresist at high speed without the use of a mask. The system must enable writing both on large surfaces with variable resolution and on multiple sub-millimeter wafers simultaneously in higheye resolution, as well as multiple recording with precise alignment and the possibility of a virtual preview before exposure. A 385 nm light source (with a possible deviation of +/-5 nm), which is suitable for positive and negative, broadband, g-, h-, i-line and also usable for SU-8 photoresists. The system must allow long-lastingexposure in high resolution with effective suppression of vibrations and temperature fluctuations. The system must include a control unit, lithography control software, and real-time imaging.
• Documents:

 Tender Notice